Brauchen Sie Hilfe?
DE
US
CA
UK
ES
FR
DE
IT
Kategorien
Baby & Kleinkind
Bekleidung & Accessoires
Bürobedarf
Elektronik
Fahrzeuge & Teile
Für Erwachsene
Gesundheit & Schönheit
Heim & Garten
Heimwerkerbedarf
Kameras & Optik
Kunst & Unterhaltung
Medien
Möbel
Nahrungsmittel, Getränke & Tabak
Software
Spielzeuge & Spiele
Sportartikel
Taschen & Gepäck
Tiere & Tierbedarf
Wirtschaft & Industrie
Information
Über uns
Geschäftsbedingungen
Datenschutz-Bestimmungen
Blog
Kontakt
Home
Medien
Bücher
Device characterization of Dy-incorporated HfO2 gate oxide nMOS device: Device characteristics and reliability of DyO/HfO gate dielectrics and the application to NAND Flash memory
Device characterization of Dy-incorporated HfO2 gate oxide nMOS device: Device characteristics and reliability of DyO/HfO gate dielectrics and the application to NAND Flash memory
58.99 EUR
Teilen:
Angebote
Gesponsert
Device characterization of Dy-incorporated HfO2 gate oxide nMOS device
Hugendubel
58.99 EUR
04-10-2026 11:59:52
Ähnliche Produkte
Fabrication and characterization of MgB2 thin films and devices: Fabrication and characterization of Magnesium Diboride thin films by co-evaporartion and of an MgB2 SQUID magnetometer
48.99 EUR
LabVIEW Run Four Point Probe Device: Electrical Characterization of Semiconducting Thin Films made easy by Four Point Probe System controlled by LabVIEW
236.00 EUR
Electrical Characterization of Metal-DNA-Metal Device: DNA in Electronics Device
35.89 EUR
Characterization and Modeling of Phase-Change Memories
196.00 EUR
Surface Modification for Organic Electronic Devices
48.99 EUR